Gratings fabrication by ultraviolet light imprinting and embossing in a sol-gel silica glass

J. E. Chisham; Mark P. Andrews; C.-Y. Li; S. Iraj Najafi; Alireza Malek-Tabrizi

doi:10.1117/12.229973

10 January 1996 Gratings fabrication by ultraviolet light imprinting and embossing in a sol-gel silica glass

J. E. Chisham, Mark P. Andrews, C.-Y. Li, S. Iraj Najafi, Alireza Malek-Tabrizi

Proceedings Volume 2695, Functional Photonic and Fiber Devices; (1996) https://doi.org/10.1117/12.229973
Event: Photonics West '96, 1996, San Jose, CA, United States

Abstract

We present simple, low temperature methods for inexpensive fabrication of gratings in a photosensitive, organically modified silicate (ORMOSIL) system for integrated optical applications. The material is prepared by the sol-gel method. Gratings are made by UV imprinting through a mask and by an embossing technique. In the first case, UV exposure induces a refractive index change of (Delta) n equals 0.005 in the film and results in an index modulation type grating. Relief type gratings are made by mechanical embossing. Gratings are compared and characterized in terms of diffraction efficiency and grating period.

Citation Download Citation

J. E. Chisham, Mark P. Andrews, C.-Y. Li, S. Iraj Najafi, and Alireza Malek-Tabrizi "Gratings fabrication by ultraviolet light imprinting and embossing in a sol-gel silica glass", Proc. SPIE 2695, Functional Photonic and Fiber Devices, (10 January 1996); https://doi.org/10.1117/12.229973

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