Pulsed laser deposition of thick films of electronic ceramics (Review Paper)

Douglas B. Chrisey; Paul C. Dorsey; James S. Horwitz; Lee A. Knauss; Raymond C. Y. Auyeung

doi:10.1117/12.237750

8 April 1996 Pulsed laser deposition of thick films of electronic ceramics (Review Paper)

Douglas B. Chrisey, Paul C. Dorsey, James S. Horwitz, Lee A. Knauss, Raymond C. Y. Auyeung

Proceedings Volume 2703, Lasers as Tools for Manufacturing of Durable Goods and Microelectronics; (1996) https://doi.org/10.1117/12.237750
Event: Photonics West '96, 1996, San Jose, CA, United States

Abstract

Pulsed laser deposition is a superior technique for the growth of high quality thin films (<EQ 1 micrometers ) of electronic ceramics and has satisfied many applications. To meet developing applications, there is a need for thick films (>= 1 micrometers ) of electronic ceramics. Two film qualities principally control the growth of thick films: the film surface morphology and film stress. The deposition parameters which affect these qualities include: film deposition rate, film-substrate lattice mismatch, film-substrate thermal coefficient of expansion mismatch, and film growth kinetics. Our results suggest that it will be difficult to fabricate thick ceramic films of suitable electronic quality by conventional physical vapor deposition techniques.

Citation Download Citation

Douglas B. Chrisey, Paul C. Dorsey, James S. Horwitz, Lee A. Knauss, and Raymond C. Y. Auyeung "Pulsed laser deposition of thick films of electronic ceramics (Review Paper)", Proc. SPIE 2703, Lasers as Tools for Manufacturing of Durable Goods and Microelectronics, (8 April 1996); https://doi.org/10.1117/12.237750

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