Absorption and laser damage threshold studies of ion-assisted pulsed-laser-deposited oxide films

Guenter Reisse; Steffen Weissmantel; Bernd Keiper; Bernhard Steiger; Ulrike Broulik

doi:10.1117/12.240375

27 May 1996 Absorption and laser damage threshold studies of ion-assisted pulsed-laser-deposited oxide films

Guenter Reisse, Steffen Weissmantel, Bernd Keiper, Bernhard Steiger, Ulrike Broulik

Author Affiliations +

Proceedings Volume 2714, 27th Annual Boulder Damage Symposium: Laser-Induced Damage in Optical Materials: 1995; (1996) https://doi.org/10.1117/12.240375
Event: Laser-Induced Damage in Optical Materials: 1995, 1995, Boulder, CO, United States

Abstract

The laterally resolved absorption and the laser damage thresholds at 1.06 micrometers wavelength of yttria and hafnia films prepared by pulsed laser deposition with oxygen ion bombardment of the growing films were investigated. Depending on the laser and ion beam parameters films with low average absorption can be prepared by that method. Consequently, high predominantly intrinsic absorption induced laser damage thresholds D₁ comparable with those of continuously evaporated films can be prepared. The more defect induced laser damage thresholds D₀, however, are largely determined by a certain number of micron- sized particulates embedded inside the films. Their number can be reduced by optimizing the laser pulse power density and the laser beam cross-section on the target, while their influence on laser damage thresholds can be reduced by increasing the ratio of oxygen ion bombardment to growth rate.

Citation Download Citation

Guenter Reisse, Steffen Weissmantel, Bernd Keiper, Bernhard Steiger, and Ulrike Broulik "Absorption and laser damage threshold studies of ion-assisted pulsed-laser-deposited oxide films", Proc. SPIE 2714, 27th Annual Boulder Damage Symposium: Laser-Induced Damage in Optical Materials: 1995, (27 May 1996); https://doi.org/10.1117/12.240375

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