Inclusion and overlayer effects on the electric fields in dielectric films

Kim F. Ferris; Gregory J. Exarhos; Steven M. Risser

doi:10.1117/12.240385

27 May 1996 Inclusion and overlayer effects on the electric fields in dielectric films

Kim F. Ferris, Gregory J. Exarhos, Steven M. Risser

Author Affiliations +

Proceedings Volume 2714, 27th Annual Boulder Damage Symposium: Laser-Induced Damage in Optical Materials: 1995; (1996) https://doi.org/10.1117/12.240385
Event: Laser-Induced Damage in Optical Materials: 1995, 1995, Boulder, CO, United States

Abstract

The surface and bulk microstructures inherent to the fabrication process of dielectric films, affects both the distribution of the local electric field intensities and its associated dielectric properties. In this paper, we have used a finite element electric field model to examine the effects of a low dielectric surface layer, alignment of a low dielectric component within the dielectric film, and the interaction of these two influences on the local electric fields and dielectric constants. Columnar microstructure and alignment of dielectric components perpendicular to the surface norm are shown to enhance electric intensities and dielectric constants. Predicted dielectric constants are compared against conventional effective medium approximation results.

Citation Download Citation

Kim F. Ferris, Gregory J. Exarhos, and Steven M. Risser "Inclusion and overlayer effects on the electric fields in dielectric films", Proc. SPIE 2714, 27th Annual Boulder Damage Symposium: Laser-Induced Damage in Optical Materials: 1995, (27 May 1996); https://doi.org/10.1117/12.240385

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