Laser-induced absorption at 355 nm in silica studied by calorimetry and photothermal deflection

Jean DiJon; E. Van Oost; Catherine Pelle; Philippe Lyan

doi:10.1117/12.240364

27 May 1996 Laser-induced absorption at 355 nm in silica studied by calorimetry and photothermal deflection

Jean DiJon, E. Van Oost, Catherine Pelle, Philippe Lyan

Author Affiliations +

Proceedings Volume 2714, 27th Annual Boulder Damage Symposium: Laser-Induced Damage in Optical Materials: 1995; (1996) https://doi.org/10.1117/12.240364
Event: Laser-Induced Damage in Optical Materials: 1995, 1995, Boulder, CO, United States

Abstract

Laser calorimetry is used to measure low losses of optical samples on the third harmonic of a YAG laser. During the experiments, degradation of bare SiO2 substrate was observed. This degradation consists of an absorption increasing with the laser pulse number. The observed evolution depends on the kind of silica tested and particularly on the OH content of the material. The observe evolution required both changes in the electron content of the existing traps and the creation of new traps or color centers. Using an Argon laser at 351 nm, relaxation of YAG induced absorption was observed. This point enables an evolution mechanism to be proposed related to charge modification of the existing traps and to a multiphoton absorption process during the YAG irradiation.

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Jean DiJon, E. Van Oost, Catherine Pelle, and Philippe Lyan "Laser-induced absorption at 355 nm in silica studied by calorimetry and photothermal deflection", Proc. SPIE 2714, 27th Annual Boulder Damage Symposium: Laser-Induced Damage in Optical Materials: 1995, (27 May 1996); https://doi.org/10.1117/12.240364

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