Overview of photothermal characterization of optical thin film coatings

Zhouling Wu; Marshall Thomsen; Pao-Kuang Kuo; Y. S. Lu; Christopher J. Stolz; Mark R. Kozlowski

doi:10.1117/12.240409

27 May 1996 Overview of photothermal characterization of optical thin film coatings

Zhouling Wu, Marshall Thomsen, Pao-Kuang Kuo, Y. S. Lu, Christopher J. Stolz, Mark R. Kozlowski

Author Affiliations +

Proceedings Volume 2714, 27th Annual Boulder Damage Symposium: Laser-Induced Damage in Optical Materials: 1995; (1996) https://doi.org/10.1117/12.240409
Event: Laser-Induced Damage in Optical Materials: 1995, 1995, Boulder, CO, United States

Abstract

Photothermal techniques are widely used in thin film characterizations and are particularly useful in studying laser-induced damage in optical coatings. The specific applications include measuring weak absorption, characterizing thermal conductivity, detecting local defects, as well as monitoring laser-interaction dynamics and determining laser damage thresholds. In this paper we take an overview of the principle of photothermal techniques, the various detection methods, and the progress made during laser decade in applying these techniques to optical thin films. Further potential and limitations of the techniques will also be discussed, with emphasis on in-situ studies of laser-interaction with thin films and local defects.

Citation Download Citation

Zhouling Wu, Marshall Thomsen, Pao-Kuang Kuo, Y. S. Lu, Christopher J. Stolz, and Mark R. Kozlowski "Overview of photothermal characterization of optical thin film coatings", Proc. SPIE 2714, 27th Annual Boulder Damage Symposium: Laser-Induced Damage in Optical Materials: 1995, (27 May 1996); https://doi.org/10.1117/12.240409

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