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27 May 1996 Application of deep x-ray lithography for fabrication of polymer regular membranes with submicrometer pores
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Abstract
The X-ray lithography with synchrotron radiation at the VEPP-3 storage ring was applied for fabrication of polymer microstructures with submicron sizes of elements and with rather high aspect ratio (up to 20). The microstructures are the regular microporous membranes with pores of 0.3-0.5 micrometers in diameter arranged with a 1 micrometers spacing. The membranes were fabricated on a base of 2.5, 3, 6 and 10 micrometers thick mylar films. In contrast to the commercial track membranes with random pore locations, the regular membranes have no dispersion of pore sizes caused by confluence of adjoining pores. The fabricated membranes have a porosity of 10-20 percent and this value can be increased up to 50 percent and higher by using an X-ray mask with an appropriate pattern. The results of the membrane examination by different techniques are presented. Possible improvements of the membrane parameters and some potential applications of the membranes are discussed as well.
© (1996) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
G. N. Kulipanov, Oleg A. Makarov, Lubov A. Mezentseva, S. I. Mishnev, Vladimir Nazmov, Valery F. Pindyurin, A. N. Skrinsky, L. D. Artamonova, G. A. Cherkov, V. N. Gashtold, V. S. Prokopenko, Vladimir V. Chesnokov, and Elena Fedorovna Reznikova "Application of deep x-ray lithography for fabrication of polymer regular membranes with submicrometer pores", Proc. SPIE 2723, Electron-Beam, X-Ray, EUV, and Ion-Beam Submicrometer Lithographies for Manufacturing VI, (27 May 1996); https://doi.org/10.1117/12.240478
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