Spherical pinch (soft x ray/EUV) and vacuum spark (soft x ray) for microlithography

Liyan Zhang; Emilio Panarella; Mariusz Bielawski; Haibo Chen

doi:10.1117/12.240479

27 May 1996 Spherical pinch (soft x ray/EUV) and vacuum spark (soft x ray) for microlithography

Liyan Zhang, Emilio Panarella, Mariusz Bielawski, Haibo Chen

Proceedings Volume 2723, Electron-Beam, X-Ray, EUV, and Ion-Beam Submicrometer Lithographies for Manufacturing VI; (1996) https://doi.org/10.1117/12.240479
Event: SPIE's 1996 International Symposium on Microlithography, 1996, Santa Clara, CA, United States

Abstract

Spherical pinch and vacuum spark have been pursued by Advanced Laser and Fusion Technology, Inc. for a number of years as candidates for point radiation source needed in microlithography. In the spherical pinch electrical energy is used to generate spherical imploding shock waves that compress a performed plasma into small (diameter < 1.0 mm) radiation source. The temperature of the central plasma can be high enough for emission of broadband radiation from the UV to the soft X-ray region of the spectrum. In the vacuum spark a small capacitor (a few nF) is discharged through two properly shaped electrodes in a vacuum. During the discharge 'hot spots' (minute high temperature plasmas) are formed in the vicinity of the anode and intense pulsed soft X-rays can be generated around the characteristic lines of the electrode materials. High rep-rate operation of the vacuum spark is necessary to provide sufficient dosage for microlithography.

Citation Download Citation

Liyan Zhang, Emilio Panarella, Mariusz Bielawski, and Haibo Chen "Spherical pinch (soft x ray/EUV) and vacuum spark (soft x ray) for microlithography", Proc. SPIE 2723, Electron-Beam, X-Ray, EUV, and Ion-Beam Submicrometer Lithographies for Manufacturing VI, (27 May 1996); https://doi.org/10.1117/12.240479

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