Standing waves reducing additives

Medhat A. Toukhy; G. McCormick

doi:10.1117/12.241852

14 June 1996 Standing waves reducing additives

Medhat A. Toukhy, G. McCormick

Proceedings Volume 2724, Advances in Resist Technology and Processing XIII; (1996) https://doi.org/10.1117/12.241852
Event: SPIE's 1996 International Symposium on Microlithography, 1996, Santa Clara, CA, United States

Abstract

Small molecules added to novolak/diazonaphthoquinone based resists plasticize their dry film coatings. This has a significant effect on standing waves reduction. Such additives allow the photo active compounds (PACs) to diffuse at reduced temperatures. Raw dissolution rate data is highly reliable for detecting standing waves. The effect of the additives on standing waves reduction is a direct function of their molar concentration in the film. Additives that are more alkaline soluble than the novolak matrix are generally preferred to avoid reducing the resist photo speed. These additives may cause serious loss in resist inhibition unless the interaction efficiency of the novolak/PAC system is sufficiently high. Non-reflective substrates are necessary to isolate and examine the effect of additives on resist dissolution without thermal or standing wave interferences. Optimal resist formulations using such additives provide high contrast systems with reduced standing waves applied over reflective substrates.

Citation Download Citation

Medhat A. Toukhy and G. McCormick "Standing waves reducing additives", Proc. SPIE 2724, Advances in Resist Technology and Processing XIII, (14 June 1996); https://doi.org/10.1117/12.241852

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