Azimuthal dependence of coherent light scatter from patterned surfaces

Greg W. Starr; E. Dan Hirleman

doi:10.1117/12.240135

21 May 1996 Azimuthal dependence of coherent light scatter from patterned surfaces

Greg W. Starr, E. Dan Hirleman

Proceedings Volume 2725, Metrology, Inspection, and Process Control for Microlithography X; (1996) https://doi.org/10.1117/12.240135
Event: SPIE's 1996 International Symposium on Microlithography, 1996, Santa Clara, CA, United States

Abstract

In the past, the theta (measured from the specular beam) dependence of light scattered from particles and features on silicon surfaces have been measured and the results presented. This paper investigates the theta and phi dependence of light scattered from patterned surfaces and patterned surfaces with defects. The focus is to extract the defect position with respect to the feature. This additional information may be used for enhanced detection and characterization of surface defects. Scattering signature variations between features and features with defects are measured and differential scattering cross sections are calculated and compared. The motivation for experimentally measuring scattering signatures is for comparison to numerical model predictions in an effort to verify model accuracy. It is anticipated that some type of model based calibration technique will be required for the next generation laser based wafer scanners due to the complex nature of light scattering from patterned semiconductor surfaces.

Citation Download Citation

Greg W. Starr and E. Dan Hirleman "Azimuthal dependence of coherent light scatter from patterned surfaces", Proc. SPIE 2725, Metrology, Inspection, and Process Control for Microlithography X, (21 May 1996); https://doi.org/10.1117/12.240135

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