Paper
21 May 1996 Depth-of-focus increase based on detector pixel size in optical microscopes
Wei P. Chen, Stephen D. Kirkish, Donald Parker
Author Affiliations +
Abstract
This paper presents an analysis of depth of focus (DOF) based on optics or detector pixel size in optical microscopes with electronic cameras. We first generally analyze DOF based on optics in different cases related to the spatial coherence of illumination and the object, and then use a design example of an infinity correction system for a review system to show DOF dependence on illumination numerical aperture. Finally, we discuss DOF increase based on detector pixel size, and then use a design example of an infinity correction system for the inspection system. Both designs are verified with simulation using CODEV, an optical design software. Both designs are used in KLA STAR-lightTM multi-surface inspection (backside glass and pellicles).
© (1996) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Wei P. Chen, Stephen D. Kirkish, and Donald Parker "Depth-of-focus increase based on detector pixel size in optical microscopes", Proc. SPIE 2725, Metrology, Inspection, and Process Control for Microlithography X, (21 May 1996); https://doi.org/10.1117/12.240128
Advertisement
Advertisement
RIGHTS & PERMISSIONS
Get copyright permission  Get copyright permission on Copyright Marketplace
KEYWORDS
Objectives

Sensors

Inspection

Microscopes

Optical microscopes

Electroluminescence

Glasses

Back to Top