Paper
7 June 1996 Application of alternating phase-shifting masks to sub-quarter-micrometer contact holes
Sung-Chul Lim, Jongwook Kye, Sang-Gyun Woo, Sunggi Kim, Hoyoung Kang, Woo-Sung Han, Young-Bum Koh
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Abstract
The performance of alternating PSM and its modified type applicable to sub-quarter micron contact holes were studied via both simulations and experiments. We focused on the contact holes as follows: the pitch of one direction was fixed to 0.4micrometers (0.73(lambda) /NA) and the pitches of another direction were varied from 0.4micrometers to 1.6micrometers (2.9(lambda) /NA). Simulations and experiments were performed with a KrF excimer system (0.45 NA and 0.3 coherence factor). The alternating PSM provided benefits in printing highly packed contact holes, whereas the hybrid PSM having a mixed form of alternating PSM and outrigger PSM showed its effects for the contact holes packed only in one direction. It was found that the performance of PSM was strongly affected by duty ratios of the contact holes. In particular, the hybrid PSM improved both the roundness of contact holes and the depth-of- focus, enabling 0.45(lambda) /NA contact holes to be printed. Therefore, either the alternating or the hybrid PSM may extend the lifetime of the optical lithography.
© (1996) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Sung-Chul Lim, Jongwook Kye, Sang-Gyun Woo, Sunggi Kim, Hoyoung Kang, Woo-Sung Han, and Young-Bum Koh "Application of alternating phase-shifting masks to sub-quarter-micrometer contact holes", Proc. SPIE 2726, Optical Microlithography IX, (7 June 1996); https://doi.org/10.1117/12.240950
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KEYWORDS
Phase shifts

Photomasks

Optical lithography

Excimers

Phase shifting

Printing

Electronics

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