Effects of radially nonsymmetric pupil filters and multiple-pupil exposure

Rudolf M. von Buenau; Hiroshi Fukuda; Tsuneo Terasawa

doi:10.1117/12.240911

7 June 1996 Effects of radially nonsymmetric pupil filters and multiple-pupil exposure

Rudolf M. von Buenau, Hiroshi Fukuda, Tsuneo Terasawa

Proceedings Volume 2726, Optical Microlithography IX; (1996) https://doi.org/10.1117/12.240911
Event: SPIE's 1996 International Symposium on Microlithography, 1996, Santa Clara, CA, United States

Abstract

In this paper, we discuss the effects of radially non-symmetric pupil filters on patterns containing only horizontal and vertical edges. Specifically, we point out that four-fold symmetry of the imaging properties can be achieved through multiple exposure of the same pattern with pupil functions that are either symmetric or anti-symmetric about two orthogonal axes. We show that such pupil functions can be sued to decrease the minimum feature size for certain bright field patterns and increase the corner sharpness for dark field patterns. We also briefly discuss the practical implementation of this multiple-pupil approach.

Citation Download Citation

Rudolf M. von Buenau, Hiroshi Fukuda, and Tsuneo Terasawa "Effects of radially nonsymmetric pupil filters and multiple-pupil exposure", Proc. SPIE 2726, Optical Microlithography IX, (7 June 1996); https://doi.org/10.1117/12.240911

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