Rigorous electromagnetic analysis of aerial image formation in photoresist

Sergey V. Babin; John T. Sheridan

doi:10.1117/12.240972

7 June 1996 Rigorous electromagnetic analysis of aerial image formation in photoresist

Sergey V. Babin, John T. Sheridan

Proceedings Volume 2726, Optical Microlithography IX; (1996) https://doi.org/10.1117/12.240972
Event: SPIE's 1996 International Symposium on Microlithography, 1996, Santa Clara, CA, United States

Abstract

A full analysis of the aerial image formation in a photoresist layer is presented. Exact boundary matching of the E-field and H-field at the top and the bottom interfaces of the photoresist allows the exposing intensity distribution inside the photoresist layer to be exactly calculated. Two approximate models for special cases producing simple analytic expressions are also developed. Experimental results are demonstrated by holographic recording of gratings in the photoresist. It is proposed to use such gratings as inexpensive and easily fabricated electron microscope, and microlithographic calibration samples.

Citation Download Citation

Sergey V. Babin and John T. Sheridan "Rigorous electromagnetic analysis of aerial image formation in photoresist", Proc. SPIE 2726, Optical Microlithography IX, (7 June 1996); https://doi.org/10.1117/12.240972

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