Characterization Of Low-Doped Metal Oxide Semiconductor (MOS) Structures Using Pulsed Photoinjection

U. Efron; J. Grinberg

doi:10.1117/12.931687

30 April 1981 Characterization Of Low-Doped Metal Oxide Semiconductor (MOS) Structures Using Pulsed Photoinjection

U. Efron, J. Grinberg

Proceedings Volume 0276, Optical Characterization Techniques for Semiconductor Technology; (1981) https://doi.org/10.1117/12.931687
Event: 1981 Microlithography Conferences, 1981, San Jose, United States

Abstract

This method, aimed at determining doping level and minority carrier lifetime of low-doped semiconductors, is based on pulsing the MOS device into deep depletion. A delayed photopulse is then applied to the sample, which causes partial collapse of the depletion region. The changes in fill time and in capacitance versus collected photocharge are measured. The minority carrier lifetime is computed through the dependence of fill time on the magnitude of the photoinjected charge. The doping level is determined by the change in capacitance following the photoinjection. The method is advantageous in: (a) independently supplying the doping level and lifetime, (b) being insensitive to edge injection, and (c) enabling the determination of the diffusion length.

Citation Download Citation

U. Efron and J. Grinberg "Characterization Of Low-Doped Metal Oxide Semiconductor (MOS) Structures Using Pulsed Photoinjection", Proc. SPIE 0276, Optical Characterization Techniques for Semiconductor Technology, (30 April 1981); https://doi.org/10.1117/12.931687

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