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19 August 1996 Application of oxygen IAD using a new high-power gridless plasma source
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An improved plasma source for use with oxygen and other gasses has shown great stability at ion power levels almost an order of magnitude above those of the other commercially available gridless sources. The original motivation of this work was to obtain a powerful a source of oxygen ions with neutralizing electrons (plasma source) for the reactive deposition of SiO2 from SiO. The results are also applicable to other gasses such as nitrogen, argon, etc., and other deposition materials. The characterization of the source in detail by the use of the design of experiments methodology is discussed.
© (1996) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Ronald R. Willey "Application of oxygen IAD using a new high-power gridless plasma source", Proc. SPIE 2776, Developments in Optical Component Coatings, (19 August 1996);


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