Optical coatings for UV photolithography systems

Harry H. Bauer; Matthias Heller; Norbert Kaiser

doi:10.1117/12.246823

19 August 1996 Optical coatings for UV photolithography systems

Harry H. Bauer, Matthias Heller, Norbert Kaiser

Proceedings Volume 2776, Developments in Optical Component Coatings; (1996) https://doi.org/10.1117/12.246823
Event: Optical Instrumentation and Systems Design, 1996, Glasgow, United Kingdom

Abstract

The performance of UV photolithography lens-systems with usually several ten optical components is limited by both the quality of the substrates and by the quality of the optical coatings. The key problems are the quality of the reflectance over large and strongly curved surfaces, the absorption and scatter losses and the behavior during heavy UV irradiation in production lines.

Citation Download Citation

Harry H. Bauer, Matthias Heller, and Norbert Kaiser "Optical coatings for UV photolithography systems", Proc. SPIE 2776, Developments in Optical Component Coatings, (19 August 1996); https://doi.org/10.1117/12.246823

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