Polarizers at 1.053 um deposited on silica substrate for high laser flux applications in a vacuum

Bernard Geenen; Herve Leplan; B. Pinot; W. Alexandre; P. Pally; Larry A. Roussel; Odile Lam

doi:10.1117/12.246815

19 August 1996 Polarizers at 1.053 _um deposited on silica substrate for high-laser-flux applications in a vacuum

Bernard Geenen, Herve Leplan, B. Pinot, W. Alexandre, P. Pally, Larry A. Roussel, Odile Lam

Author Affiliations +

Proceedings Volume 2776, Developments in Optical Component Coatings; (1996) https://doi.org/10.1117/12.246815
Event: Optical Instrumentation and Systems Design, 1996, Glasgow, United Kingdom

Abstract

The French Megajoule Project requires polarizers with high laser-induced damage thresholds. Such polarizers must be deposited on silica substrates, which are commonly prone to stress leading to early failure. Better stress control in the films require an optimization of the stack design as well as the deposition parameters. The thermal e-beam technique is used. We present the spectral behavior of such 1.03 micrometers polarizers in air and under vacuum at the Brewster incidence angle of 55 degrees 4 along with the damage test results.

Citation Download Citation

Bernard Geenen, Herve Leplan, B. Pinot, W. Alexandre, P. Pally, Larry A. Roussel, and Odile Lam "Polarizers at 1.053 _um deposited on silica substrate for high-laser-flux applications in a vacuum", Proc. SPIE 2776, Developments in Optical Component Coatings, (19 August 1996); https://doi.org/10.1117/12.246815

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