Optical imaging of small structures in optical lithography: high focal depth with optical filters.

R. Hild

doi:10.1117/12.2298922

1 September 1996 Optical imaging of small structures in optical lithography: high focal depth with optical filters.

R. Hild

Proceedings Volume 2778, 17th Congress of the International Commission for Optics: Optics for Science and New Technology; 277814 (1996) https://doi.org/10.1117/12.2298922
Event: 17th Congress of the International Commission for Optics: Optics for Science and New Technology, 1996, Taejon, Korea, Republic of

Abstract

The main goal in photolithography is to produce smaller and smaller structures with high Depth of Focus (DOF). In this contribution the image intensity of small isolated structures is studied under the influence of nonuniform pupils. Special interest is dedicated to axial apodizing filters, which produce high DOF with sufficient small line width. The influence of partial coherent illumination has been taken into account.

Citation Download Citation

R. Hild "Optical imaging of small structures in optical lithography: high focal depth with optical filters.", Proc. SPIE 2778, 17th Congress of the International Commission for Optics: Optics for Science and New Technology, 277814 (1 September 1996); https://doi.org/10.1117/12.2298922

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