High-efficiency second-harmonic generation of copper vapor laser and its application in sub-micron photolithography

Hong Ren

doi:10.1117/12.2298923

1 September 1996 High-efficiency second-harmonic generation of copper vapor laser and its application in sub-micron photolithography

Hong Ren

Author Affiliations +

Proceedings Volume 2778, 17th Congress of the International Commission for Optics: Optics for Science and New Technology; 277815 (1996) https://doi.org/10.1117/12.2298923
Event: 17th Congress of the International Commission for Optics: Optics for Science and New Technology, 1996, Taejon, Korea, Republic of

Abstract

Three approaches available to raise the conversion efficiency of the sec- ond harmonic generation of copper vapor laser in a BBO crystal have been demonstrated. The high optical conversion efficiency, 14.4%, was achieved at 5.4-W coppor vapor laser power. Sub-micron photolithography was attained using the second harmonic light of coppor vapor laser, a new UV light at 255.3-mxi, by a 1:1 catadioptric high NA lithog- raphy lens for the first time. The resolution of lines was 0.7-pm.

Citation Download Citation

Hong Ren "High-efficiency second-harmonic generation of copper vapor laser and its application in sub-micron photolithography", Proc. SPIE 2778, 17th Congress of the International Commission for Optics: Optics for Science and New Technology, 277815 (1 September 1996); https://doi.org/10.1117/12.2298923

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