Mo-Si multilayer as soft x-ray mirrors for the wavelengths around 20 nm region

Dong-Eon Kim

doi:10.1117/12.2316287

1 September 1996 Mo-Si multilayer as soft x-ray mirrors for the wavelengths around 20 nm region

Dong-Eon Kim

Proceedings Volume 2778, 17th Congress of the International Commission for Optics: Optics for Science and New Technology; 2778GM (1996) https://doi.org/10.1117/12.2316287
Event: 17th Congress of the International Commission for Optics: Optics for Science and New Technology, 1996, Taejon, Korea, Republic of

Abstract

Molybdenum-silicon multilayer soft x-ray mirrors have been fabricated using a magnetron sputtering system. Their structures have been characterized by x-ray diffraction (XRD) and reflectivities at normal incidence have been measured by using monochromatized synchrotron radiation in the 18-24 nm region. A normal incidence reflectivity as high as 40% at 20.8 nm was achieved.

Citation Download Citation

Dong-Eon Kim "Mo-Si multilayer as soft x-ray mirrors for the wavelengths around 20 nm region", Proc. SPIE 2778, 17th Congress of the International Commission for Optics: Optics for Science and New Technology, 2778GM (1 September 1996); https://doi.org/10.1117/12.2316287

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