Laser reactive ablation deposition of carbon nitride thin films

Armando Luches; A. P. Caricato; Gilberto Leggieri; Maurizio Martino; Alessio Perrone; G. Barucca; Paolo Mengucci; Joseph Zemek

doi:10.1117/12.251190

23 September 1996 Laser reactive ablation deposition of carbon nitride thin films

Armando Luches, A. P. Caricato, Gilberto Leggieri, Maurizio Martino, Alessio Perrone, G. Barucca, Paolo Mengucci, Joseph Zemek

Author Affiliations +

Proceedings Volume 2789, High-Power Lasers: Applications and Emerging Applications; (1996) https://doi.org/10.1117/12.251190
Event: Lasers, Optics, and Vision for Productivity in Manufacturing I, 1996, Besancon, France

Abstract

Thin amorphous C-N films were deposited on silicon substrates at room temperature by XeCl laser ablation of graphite in low pressure nitrogen and ammonia atmospheres. The deposition rates decrease with increasing ambient pressure. Films deposited in NH₃ are thinner than films deposited in N₂ at the same ambient pressure, their N/C atomic ratios are higher, but they present a lower quantity of N atoms bound to C atoms. Different diagnostic techniques were used to characterize the deposited films, which result homogeneous, hard and present a high electrical resistivity.

Citation Download Citation

Armando Luches, A. P. Caricato, Gilberto Leggieri, Maurizio Martino, Alessio Perrone, G. Barucca, Paolo Mengucci, and Joseph Zemek "Laser reactive ablation deposition of carbon nitride thin films", Proc. SPIE 2789, High-Power Lasers: Applications and Emerging Applications, (23 September 1996); https://doi.org/10.1117/12.251190

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