Cleaning process for x-ray masks

Yasunao Saitoh; Takashi Ohkubo; Ikuo Okada; Misao Sekimoto; Tadahito Matsuda

doi:10.1117/12.245199

24 July 1996 Cleaning process for x-ray masks

Yasunao Saitoh, Takashi Ohkubo, Ikuo Okada, Misao Sekimoto, Tadahito Matsuda

Proceedings Volume 2793, Photomask and X-Ray Mask Technology III; (1996) https://doi.org/10.1117/12.245199
Event: Symposium on Photomask and X-Ray Mask Technology, 1996, Kawasaki City, Japan

Abstract

A cleaning process for x-ray mask fabrication has been developed that virtually eliminates mask defects. To introduce the wet-cleaning process into the x-ray mask fabrication process, a new mask cleaning system is manufactured to prevent the mask membrane from breaking due to liquid pressure. Because Ta is chemically stable to a strong acid, we employ a wet-cleaning process using a strong acid such as H2S04 + H202 in order to eliminate contamination that occurs in the x-ray mask fabrication process, such as back-etching of the substrate. and Ta pattern etching. Most metallic and organic defects were eliminated by the strong acid wet-cleaning. By introducing this cleaning process, occurrence of mask defects was drastically reduced: the defect density was reduced to less than 5 defects/cm² The patterns with widths below 0.2 μm were not damaged by acid cleaning, and pattern positioning distortion did not occur.

Citation Download Citation

Yasunao Saitoh, Takashi Ohkubo, Ikuo Okada, Misao Sekimoto, and Tadahito Matsuda "Cleaning process for x-ray masks", Proc. SPIE 2793, Photomask and X-Ray Mask Technology III, (24 July 1996); https://doi.org/10.1117/12.245199

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