EUV spectrometric facility with laser-focus plasma radiation source

Valeri O. Papanyan; Gagik Ts. Nersisyan

doi:10.1117/12.245103

19 July 1996 EUV spectrometric facility with laser-focus plasma radiation source

Valeri O. Papanyan, Gagik Ts. Nersisyan

Proceedings Volume 2805, Multilayer and Grazing Incidence X-Ray/EUV Optics III; (1996) https://doi.org/10.1117/12.245103
Event: SPIE's 1996 International Symposium on Optical Science, Engineering, and Instrumentation, 1996, Denver, CO, United States

Abstract

A spectrometric facility for measurements of reflection, absorption and excitation spectra of films and massive samples in 50 to 300 nm wavelength region with the spectral resolution up to 10³ is designed and tested. Plasma produced EUV radiation from the laser beam focused onto a gaseous or a solid target makes it possible to achieve the spectral intensity on a sample up to 3(DOT)10⁶ photons/s(DOT)cm^-1. Application to measurement of reflection spectra of some phthalocynines is reported here.

Citation Download Citation

Valeri O. Papanyan and Gagik Ts. Nersisyan "EUV spectrometric facility with laser-focus plasma radiation source", Proc. SPIE 2805, Multilayer and Grazing Incidence X-Ray/EUV Optics III, (19 July 1996); https://doi.org/10.1117/12.245103

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