Tunable single-frequency III-V semiconductor diode lasers with wavelengths from 0.76 to 2.7 um

Ramon U. Martinelli; Raymond J. Menna; Pamela K. York; Dmitri Z. Garbuzov; Hao Lee; Joseph H. Abeles; Nancy A. Morris; John C. Connolly; S. Yegna Narayan; Jacobus S. Vermaak; Gregory H. Olsen; David E. Cooper; Clinton B. Carlisle; Haris Riris; Anthony L. Cook

doi:10.1117/12.255311

21 October 1996 Tunable single-frequency III-V semiconductor diode lasers with wavelengths from 0.76 to 2.7 μm

Ramon U. Martinelli, Raymond J. Menna, Pamela K. York, Dmitri Z. Garbuzov, Hao Lee, Joseph H. Abeles, Nancy A. Morris, John C. Connolly, S. Yegna Narayan, Jacobus S. Vermaak, Gregory H. Olsen, David E. Cooper, Clinton B. Carlisle, Haris Riris, Anthony L. Cook

Author Affiliations +

Proceedings Volume 2834, Application of Tunable Diode and Other Infrared Sources for Atmospheric Studies and Industrial Process Monitoring; (1996) https://doi.org/10.1117/12.255311
Event: SPIE's 1996 International Symposium on Optical Science, Engineering, and Instrumentation, 1996, Denver, CO, United States

Abstract

We have fabricated single-frequency diode lasers from a number of III-V semiconducting compounds. These diode lasers were specifically designed for laser absorption spectroscopy. Their emission wavelengths span the internal of 0.76 to 2.7 micrometers . Water vapor, CO, CO₂, NH₃, CH₄ HF, and O₂ have been detected using them. After a brief review of their physical structure and principles of operation, we present representative output characteristics of these lasers, along with a discussion of several important applications.

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Ramon U. Martinelli, Raymond J. Menna, Pamela K. York, Dmitri Z. Garbuzov, Hao Lee, Joseph H. Abeles, Nancy A. Morris, John C. Connolly, S. Yegna Narayan, Jacobus S. Vermaak, Gregory H. Olsen, David E. Cooper, Clinton B. Carlisle, Haris Riris, and Anthony L. Cook "Tunable single-frequency III-V semiconductor diode lasers with wavelengths from 0.76 to 2.7 μm", Proc. SPIE 2834, Application of Tunable Diode and Other Infrared Sources for Atmospheric Studies and Industrial Process Monitoring, (21 October 1996); https://doi.org/10.1117/12.255311

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