Chemical-vapor-deposited SiC for high heat flux applications

Jitendra Singh Goela; Michael A. Pickering; Lee E. Burns

doi:10.1117/12.259820

21 November 1996 Chemical-vapor-deposited SiC for high heat flux applications

Jitendra Singh Goela, Michael A. Pickering, Lee E. Burns

Proceedings Volume 2855, High Heat Flux Engineering III; (1996) https://doi.org/10.1117/12.259820
Event: SPIE's 1996 International Symposium on Optical Science, Engineering, and Instrumentation, 1996, Denver, CO, United States

Abstract

Important properties and applications of CVD SILICON CARBIDE^TM with particular emphasis on high heat loads are reviewed. Data on the mechanical and thermal properties of CVD-SiC as function of temperature are presented. Further, the effect of different high temperature treatments on flexural strength of CVD-SiC is discussed and the thermal shock resistance of CVD-SiC is compared to other competing materials. Finally, several high heat flux applications in the areas of optics, semiconductor processing and wear parts are discussed.

Citation Download Citation

Jitendra Singh Goela, Michael A. Pickering, and Lee E. Burns "Chemical-vapor-deposited SiC for high heat flux applications", Proc. SPIE 2855, High Heat Flux Engineering III, (21 November 1996); https://doi.org/10.1117/12.259820

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