Experimental results with cryogenically cooled thin silicon crystal x-ray monochromators on high heat flux beamlines

Carey Shawn Rogers; Dennis M. Mills; Wah Keat Lee; Patricia B. Fernandez; Timothy Graber

doi:10.1117/12.259830

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21 November 1996 Experimental results with cryogenically cooled thin silicon crystal x-ray monochromators on high heat flux beamlines

Carey Shawn Rogers, Dennis M. Mills, Wah Keat Lee, Patricia B. Fernandez, Timothy Graber

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Proceedings Volume 2855, High Heat Flux Engineering III; (1996) https://doi.org/10.1117/12.259830
Event: SPIE's 1996 International Symposium on Optical Science, Engineering, and Instrumentation, 1996, Denver, CO, United States

Abstract

A novel, silicon crystal monochromator has been designed and tested for use on undulator and focused wiggler beamlines at third-generation synchrotron sources. The crystal utilizes a thin, partially transmitting diffracting element fabricated within a liquid-nitrogen cooled, monolithic block of silicon. This report summarizes the results from performance tests conducted at the European Synchrotron Radiation Facility (ESRF) using a focused wiggler beam and at the Advanced Photon Source (APS) on an undulator beamline. These experiments indicate that a cryogenic crystal can handle the very high power and power density x-ray beams of modern synchrotrons with sub-arcsec thermal broadening of the rocking curve. The peak power density absorbed on the surface of the crystal at he ESRF exceeded 90 W/mm² with an absorbed power of 166 W, this takes into account the spreading of the beam due to the Bragg angle of 11.4 degrees. At the APS, the peak heat flux incident on the crystal was 1.5 W/mA/mm² with a power of 6.1 W/mA for a 2.0 H X 2.5 V mm² beam at an undulator gap of 11.1 mm and stored current up to 96 mA.

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Carey Shawn Rogers, Dennis M. Mills, Wah Keat Lee, Patricia B. Fernandez, and Timothy Graber "Experimental results with cryogenically cooled thin silicon crystal x-ray monochromators on high heat flux beamlines", Proc. SPIE 2855, High Heat Flux Engineering III, (21 November 1996); https://doi.org/10.1117/12.259830

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