Monolithic silicon x-ray interferometer with varying mirror-analyzer spacing for the analysis of beam coherence

Hiroshi Yamazaki; Tetsuya Ishikawa

doi:10.1117/12.259859

22 November 1996 Monolithic silicon x-ray interferometer with varying mirror-analyzer spacing for the analysis of beam coherence

Hiroshi Yamazaki, Tetsuya Ishikawa

Author Affiliations +

Proceedings Volume 2856, Optics for High-Brightness Synchrotron Radiation Beamlines II; (1996) https://doi.org/10.1117/12.259859
Event: SPIE's 1996 International Symposium on Optical Science, Engineering, and Instrumentation, 1996, Denver, CO, United States

Abstract

A Laue-Laue-Laue x-ray interferometer with the inclined third crystal plate was fabricated to demonstrate wavefront- dividing interferometry in x-ray region. Observed interference patterns showed the effects of spatial coherence of the incident wave, in addition to the incident angle dependent spatial fringes expected from the dynamical theory of diffraction. From the visibility of the interference pattern, the source size used was estimated using Van Cittert-Zernike theorem.

Citation Download Citation

Hiroshi Yamazaki and Tetsuya Ishikawa "Monolithic silicon x-ray interferometer with varying mirror-analyzer spacing for the analysis of beam coherence", Proc. SPIE 2856, Optics for High-Brightness Synchrotron Radiation Beamlines II, (22 November 1996); https://doi.org/10.1117/12.259859

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