Paper
22 November 1996 Performance of the VUV high-resolution and high-flux beamline for chemical dynamics studies at the Advanced Light Source
Philip A. Heimann, Masato Koike, Chia Wei Hsu, Matt D. Evans, Cheuk Yiu Ng, D. Blank Hildebrand, Xueming Yang, C. Flaim, Arthur G. Suits, Yuan T. Lee
Author Affiliations +
Abstract
At the Advanced Light Source an undulator beamline, with an energy range from 6 to 30 eV, has been constructed for chemical dynamics experiments. The higher harmonics of the undulator are suppressed by a novel, windowless gas filter. In one branchline high flux, 2% bandwidth radiation is directed toward an end station for photodissociation and crossed molecular beam experiments. A photon flux of 1016 photon/sec has been measured at this end station. In a second branchline a 6.65 m off-plane Eagle monochromator delivers narrow bandwidth radiation to an end station for photoionization studies. At this second end station a peak flux of 3 X 1011 was observed for 25,000 resolving power. This monochromator has achieved a resolving power of 70,000 using a 4800 grooves/mm grating, one of the highest resolving powers obtained by a VUV monochromator.
© (1996) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Philip A. Heimann, Masato Koike, Chia Wei Hsu, Matt D. Evans, Cheuk Yiu Ng, D. Blank Hildebrand, Xueming Yang, C. Flaim, Arthur G. Suits, and Yuan T. Lee "Performance of the VUV high-resolution and high-flux beamline for chemical dynamics studies at the Advanced Light Source", Proc. SPIE 2856, Optics for High-Brightness Synchrotron Radiation Beamlines II, (22 November 1996); https://doi.org/10.1117/12.259853
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Cited by 18 scholarly publications.
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KEYWORDS
Mirrors

Monochromators

Neon

Silicon

Reflectivity

Spectral resolution

Diffraction gratings

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