Status of the optical metrology at the ESRF

Olivier Hignette; Amparo Rommeveaux

doi:10.1117/12.259863

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22 November 1996 Status of the optical metrology at the ESRF

Olivier Hignette, Amparo Rommeveaux

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Proceedings Volume 2856, Optics for High-Brightness Synchrotron Radiation Beamlines II; (1996) https://doi.org/10.1117/12.259863
Event: SPIE's 1996 International Symposium on Optical Science, Engineering, and Instrumentation, 1996, Denver, CO, United States

Abstract

Beamline optical components and their dynamic holding and bending systems are qualified at the ESRF in the optical metrology laboratory, which has been moved recently into the ESRF experimental hall. Software and hardware enhancements of the five instruments used to perform these ex situ characterizations are described. In situ beamline mirror metrology using a wavefront analyzer has been introduced in ID24 and ID20 beamlines. The design of the analyzer, its architecture with respect to the mirror chambers and its use in active optics control with mechanical and bimorph benders are described in this paper.

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Olivier Hignette and Amparo Rommeveaux "Status of the optical metrology at the ESRF", Proc. SPIE 2856, Optics for High-Brightness Synchrotron Radiation Beamlines II, (22 November 1996); https://doi.org/10.1117/12.259863

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