100-kV electron gun for the x-ray mask writer EB-X2

Kenichi Saito; Junichi Kato; Nobuo Shimazu; Akira Shimizu

doi:10.1117/12.255500

25 October 1996 100-kV electron gun for the x-ray mask writer EB-X2

Kenichi Saito, Junichi Kato, Nobuo Shimazu, Akira Shimizu

Proceedings Volume 2858, Charged-Particle Optics II; (1996) https://doi.org/10.1117/12.255500
Event: SPIE's 1996 International Symposium on Optical Science, Engineering, and Instrumentation, 1996, Denver, CO, United States

Abstract

This paper describes a 100-kV thermal-emission electron gun developed for the X-ray mask writer, EB-X2, which employs a variable-shaped electron beam with a beam edge resolution of 20 nm. The optimized design of the EB-X2 electron optical system requires that the electron gun have crossover diameters of 50 micrometers and an optical length of less than 100 mm. So the crossover diameters of the gun were accurately calculated with an electron ray tracing program, and a gun with the required crossover diameters and optical length was designed. The gun was constructed, and the crossover diameters were measured. The measured values agree well with the calculated ones, and this confirms that the gun is suitable for use in the EB-X2 electron optical system.

Citation Download Citation

Kenichi Saito, Junichi Kato, Nobuo Shimazu, and Akira Shimizu "100-kV electron gun for the x-ray mask writer EB-X2", Proc. SPIE 2858, Charged-Particle Optics II, (25 October 1996); https://doi.org/10.1117/12.255500

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KEYWORDS

Ray tracing

Electron beams

X-rays

Electrodes

Optical design

Photomasks

Geometrical optics

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