Surface haze in the Stokes-Mueller representation

Eugene L. Church; John C. Stover

doi:10.1117/12.256191

4 November 1996 Surface haze in the Stokes-Mueller representation

Eugene L. Church, John C. Stover

Proceedings Volume 2862, Flatness, Roughness, and Discrete Defect Characterization for Computer Disks, Wafers, and Flat Panel Displays; (1996) https://doi.org/10.1117/12.256191
Event: SPIE's 1996 International Symposium on Optical Science, Engineering, and Instrumentation, 1996, Denver, CO, United States

Abstract

This paper derives the Mueller scattering matrices for two topographic scattering models--the Rayleigh-Rice or perturbation model and the geometrical-optics or facet model. The results are used to predict the polarimetric properties of the `haze' on silicon-wafer surfaces.

Citation Download Citation

Eugene L. Church and John C. Stover "Surface haze in the Stokes-Mueller representation", Proc. SPIE 2862, Flatness, Roughness, and Discrete Defect Characterization for Computer Disks, Wafers, and Flat Panel Displays, (4 November 1996); https://doi.org/10.1117/12.256191

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available