Dry resist technology to fabricate optimized microlenses centered to the end of a monomode fiber with electron-beam lithography

Sergey V. Babin; Mark A. Weber; Hans W. P. Koops

doi:10.1117/12.256212

1 November 1996 Dry resist technology to fabricate optimized microlenses centered to the end of a monomode fiber with electron-beam lithography

Sergey V. Babin, Mark A. Weber, Hans W. P. Koops

Author Affiliations +

Proceedings Volume 2863, Current Developments in Optical Design and Engineering VI; (1996) https://doi.org/10.1117/12.256212
Event: SPIE's 1996 International Symposium on Optical Science, Engineering, and Instrumentation, 1996, Denver, CO, United States

Abstract

The fabrication of microlenses on flat and three-dimensional substrates is described. A totally dry resist process is used. The characteristics of this novel process are investigated. A technique for lens positioning and exposure was developed for a scanning electron microscope using an image processor as a beam control system. The hyperbolic profile of the microlenses is computer generated. Microlenses of cylindrical, round, and elliptical geometry were fabricated on a Si wafer and on the end of a monomode quartz fiber. Focusing of infrared light by fabricated microlenses is demonstrated.

Citation Download Citation

Sergey V. Babin, Mark A. Weber, and Hans W. P. Koops "Dry resist technology to fabricate optimized microlenses centered to the end of a monomode fiber with electron-beam lithography", Proc. SPIE 2863, Current Developments in Optical Design and Engineering VI, (1 November 1996); https://doi.org/10.1117/12.256212

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