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31 December 1996 Alignment of ferroelectric liquid crystal on ultrathin silicon monoxide film evaporated at 80o
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Proceedings Volume 2866, International Conference on Holography and Optical Information Processing (ICHOIP '96); (1996) https://doi.org/10.1117/12.263131
Event: International Conference on Holography and Optical Information Processing, 1996, Nanjing, China
Abstract
A method for obtaining uniform alignment of ferroelectric liquid crystal (FLC) is presented. The uniform alignment is realized by ultrathin (< 80 angstroms) silicon monoxide (SiO) film evaporated at 80 degree(s) and the treatment of A.C. electric field. The alignment effects of ultrathin SiO film and thick SiO film (> 1000 angstroms) both evaporated at 80 degree(s) are compared. The layer direction of FLC cell with ultrathin SiO film at 80 degree(s) is perpendicular to that with thick film at the same deposition angle. The advantage of the ultrathin film is that the FLC cell aligned by this method can be easily treated to exhibit perfect bistability, excellent contrast and fast switching speed. The possible relation between the molecular orientation and the topographies of the SiO films is analyzed.
© (1996) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
ShengAn Xiao, XueWu Zhou, and Ke-shu Xu "Alignment of ferroelectric liquid crystal on ultrathin silicon monoxide film evaporated at 80o", Proc. SPIE 2866, International Conference on Holography and Optical Information Processing (ICHOIP '96), (31 December 1996); https://doi.org/10.1117/12.263131
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