Nematic thin layer self-organization caused by semiconductor surface superlattice

Alexander P. Fedtchouk; Ruslana A. Rudenko; Larisa D. Shevchenko; Yuri Kornienko

doi:10.1117/12.250941

13 September 1996 Nematic thin layer self-organization caused by semiconductor surface superlattice

Alexander P. Fedtchouk, Ruslana A. Rudenko, Larisa D. Shevchenko, Yuri Kornienko

Proceedings Volume 2877, Optical Characterization Techniques for High-Performance Microelectronic Device Manufacturing III; (1996) https://doi.org/10.1117/12.250941
Event: Microelectronic Manufacturing 1996, 1996, Austin, TX, United States

Abstract

We have examined experimentally the parameters of the photo- e.m.f. generated in the system containing the monocrystalline semiconductor and thin layer of nematic liquid crystal (NLC). Registered maxima quantity perfectly correlates with the ordering axis number. The present paper shows one of the ways of biaxial molecular ordering in NLC not registered before. It was shown also that the proposed method is both applicable as to the semiconductor surface superlattice symmetry type analysis and also to the ordered LC molecules concentration evaluation.

Citation Download Citation

Alexander P. Fedtchouk, Ruslana A. Rudenko, Larisa D. Shevchenko, and Yuri Kornienko "Nematic thin layer self-organization caused by semiconductor surface superlattice", Proc. SPIE 2877, Optical Characterization Techniques for High-Performance Microelectronic Device Manufacturing III, (13 September 1996); https://doi.org/10.1117/12.250941

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