Paper
27 December 1996 1996 mask industry quality assessment
Timothy Eichenseer, Chris Bishop
Author Affiliations +
Abstract
The fourth annual mask industry assessment will again survey various industry companies for key performance measurements in the areas of safety, quality, delivery, and throughput time. The data complied includes safety incident rate, mask shipment volume, customer return rate, customer return reason, mask survival yield, delivery performance to schedule, and throughput time from 1988 through Q2, 1996. To enhance the 1996 assessment, the performance data will be collected by categories of defect size specifications. Participant identity remains protected by utilizing Arthur Anderson & Company to ensure confidentiality. The 1995 assessment contained data from all major U.S. merchant and captive suppliers along with two international shops. In 1996, all mask makers world wide will again be invited to participate to further enhance the value of this benchmarking exercise.
© (1996) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Timothy Eichenseer and Chris Bishop "1996 mask industry quality assessment", Proc. SPIE 2884, 16th Annual BACUS Symposium on Photomask Technology and Management, (27 December 1996); https://doi.org/10.1117/12.262802
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KEYWORDS
Safety

Photomasks

Reticles

Pellicles

Printing

Tolerancing

Inspection

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