Lithography tricks and tribulations

Joseph G. Garofalo; Pat G. Watson; Lee E. Trimble; Raymond A. Cirelli; Albert Colina; Ilya M. Grodnensky; B. Herrero; A. Dunbar; Frederick R. Peiffer; R. Takahashi; Regine G. Tarascon-Auriol; Willie J. Yarbrough; Ludwik J. Zych

doi:10.1117/12.262814

27 December 1996 Lithography tricks and tribulations

Joseph G. Garofalo, Pat G. Watson, Lee E. Trimble, Raymond A. Cirelli, Albert Colina, Ilya M. Grodnensky, B. Herrero, A. Dunbar, Frederick R. Peiffer, R. Takahashi, Regine G. Tarascon-Auriol, Willie J. Yarbrough, Ludwik J. Zych

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Proceedings Volume 2884, 16th Annual BACUS Symposium on Photomask Technology and Management; (1996) https://doi.org/10.1117/12.262814
Event: 16th Annual BACUS Symposium on Photomask Technology and Management, 1996, Redwood City, CA, United States

Abstract

When considering optical lithography, there is no true substitute for the resolution enhancements afforded by a reduction in actinic radiation. However, as we move below 365 nm i-line systems, the optics and attendant materials considerations become acute. Additionally, there is an obvious economic impetus to breath new life into existing exposure systems. Various optical enhancement schemes have been developed over the past few years for these and other reasons. While many of these are well suited for the patterns and economics of memories, there are a few that enable sub 0.5 k_l ASIC imaging. These include: large NA, optical proximity correction, and the deployment of sub- resolution assist features. We will demonstrate a blend of these that will support 280 nm ASIC pattern delineation with i-line (365 nm) systems and binary (non-phase-shift) masks.

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Joseph G. Garofalo, Pat G. Watson, Lee E. Trimble, Raymond A. Cirelli, Albert Colina, Ilya M. Grodnensky, B. Herrero, A. Dunbar, Frederick R. Peiffer, R. Takahashi, Regine G. Tarascon-Auriol, Willie J. Yarbrough, and Ludwik J. Zych "Lithography tricks and tribulations", Proc. SPIE 2884, 16th Annual BACUS Symposium on Photomask Technology and Management, (27 December 1996); https://doi.org/10.1117/12.262814

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