Analysis of near-field holographic pattern formation using phase masks

Genxiang Chen; Shuisheng Jian; Ling Yang; Xun Li; Huang Ge; Wei Wang

doi:10.1117/12.251862

23 September 1996 Analysis of near-field holographic pattern formation using phase masks

Genxiang Chen, Shuisheng Jian, Ling Yang, Xun Li, Huang Ge, Wei Wang

Proceedings Volume 2885, Holographic Optical Elements and Displays; (1996) https://doi.org/10.1117/12.251862
Event: Photonics China '96, 1996, Beijing, China

Abstract

The near-field holographic interference patterns of phase masks irradiated by excimer lasers is analyzed in details theoretically in this paper. The interference intensity patterns produced by periodic phase masks are calculated using scalar diffraction modeling with various assumptions of mask parameters.

Citation Download Citation

Genxiang Chen, Shuisheng Jian, Ling Yang, Xun Li, Huang Ge, and Wei Wang "Analysis of near-field holographic pattern formation using phase masks", Proc. SPIE 2885, Holographic Optical Elements and Displays, (23 September 1996); https://doi.org/10.1117/12.251862

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