Investigation of absorption saturation in diode end-pumped microchip lasers

Zhiping Cai; Alain M. Chardon; Francisco M. Sanchez; Guy Michel Stephan

doi:10.1117/12.253250

30 September 1996 Investigation of absorption saturation in diode end-pumped microchip lasers

Zhiping Cai, Alain M. Chardon, Francisco M. Sanchez, Guy Michel Stephan

Proceedings Volume 2889, High-Power Lasers: Solid State, Gas, Excimer, and Other Advanced Lasers; (1996) https://doi.org/10.1117/12.253250
Event: Photonics China '96, 1996, Beijing, China

Abstract

Two sorts of microchip laser materials, such as Nd:YVO₄ and Er/Yb:Cr phosphate Kigre glass, are used to perform the experimental study of pump absorption saturation. A spatial- dependent rate equation model has been developed for the simulation, and hence the corresponding absorption saturation intensities are determined, the pump saturation intensity is 840 W/cm² in the (pi) -polarization, and 2200 W/cm² in the (sigma) -polarization for the 3% a-cut Nd:YVO₄ crystal for the 810 nm pump wavelength, and 130 kW/cm² for Er/Yb:Cr phosphate Kigre glass for the 975 nm pump wavelength. Based on this nonlinear absorption effect, a high performance LD end-pumped Nd:YVO₄ microchip laser was obtained with a low pump threshold of 3 mW and a high slope efficiency of 50%, while for Er/Yb:Cr phosphate Kigre glass laser, a low pump threshold of 5 mW and 20% slope efficiency was obtained when pumped by a Ti:Sapphire laser. All the laser operated in a single transverse mode, and the 1.535 micrometers laser operated at a single longitudinal mode. This study gives a useful guideline to design and to optimize the pump beam radius of LD end-pumped microchip lasers.

Citation Download Citation

Zhiping Cai, Alain M. Chardon, Francisco M. Sanchez, and Guy Michel Stephan "Investigation of absorption saturation in diode end-pumped microchip lasers", Proc. SPIE 2889, High-Power Lasers: Solid State, Gas, Excimer, and Other Advanced Lasers, (30 September 1996); https://doi.org/10.1117/12.253250

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