Metalorganic chemical vapor deposition of BaTiO3 thin film and its physical properties

Hui Wang; J.M. Zeng; Z. H. Wang; M. Wang; S. X. Shang

doi:10.1117/12.253243

30 September 1996 Metalorganic chemical vapor deposition of BaTiO3 thin film and its physical properties

Hui Wang, J.M. Zeng, Z. H. Wang, M. Wang, S. X. Shang

Proceedings Volume 2896, Photorefractive Materials; (1996) https://doi.org/10.1117/12.253243
Event: Photonics China '96, 1996, Beijing, China

Abstract

BaTiO₃ is a typical perovskite ferroelectric with unique photorefractive, electro-optic and dielectric properties, the thin film of BaTiO₃ is suitable to be used in integrated optic and photorefractive devices. In this paper we report the growth of BaTiO₃ thin film on Si (100) substrate by atmospheric pressure metalorganic chemical vapor deposition technique. The souse materials used were Ba(thd)₂ and titanium isopropoxied. The substrate temperature was from 620 degrees Celsius to 780 degrees Celsius. The orientation of as-grown BaTiO₃ films is dependent on growth temperature. The dielectric constant ((epsilon) ) and loss tangent (tan(delta) ) of BaTiO₃ film with (001) orientation are found to be 114 and 0.02, respectively, for a 0.8 micrometer-thick film at room temperature. The remanent polarization (Pr) was 2.3 (mu) C/cm² and coercive field (Ec) was 14 KV/cm.

Citation Download Citation

Hui Wang, J.M. Zeng, Z. H. Wang, M. Wang, and S. X. Shang "Metalorganic chemical vapor deposition of BaTiO3 thin film and its physical properties", Proc. SPIE 2896, Photorefractive Materials, (30 September 1996); https://doi.org/10.1117/12.253243

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