Large-scale flourine-doped textured transparent conducting SnO2 films deposited by APCVD

Honglei Ma; Deheng Zhang; Youpeng Chen; Shuying Li; Jin Ma; Fujian Zong

doi:10.1117/12.252947

3 October 1996 Large-scale flourine-doped textured transparent conducting SnO2 films deposited by APCVD

Honglei Ma, Deheng Zhang, Youpeng Chen, Shuying Li, Jin Ma, Fujian Zong

Proceedings Volume 2897, Electro-Optic and Second Harmonic Generation Materials, Devices, and Applications; (1996) https://doi.org/10.1117/12.252947
Event: Photonics China '96, 1996, Beijing, China

Abstract

Large scale (30 by 30 cm) transparent conducting F-doped textured SnO₂ films have been prepared by atmosphere pressure chemical vapor deposition (APCVD). Uniformly polycrystalline SnO₂:F films having a variable preferred orientation have been obtained with resistivity as low as 5 multiplied by 10^-4 (Omega) cm, with carrier concentrations between 3.5 multiplied by 10²⁰ and 7 multiplied by 10²⁰ cm^-3 and Hall mobilities from 15.7 to 20.1 cm² V/s. The average transmittance (including diffusion transmittance) is higher than 90% in the wavelength range of the visible spectrum and the maximum infrared reflectance reaches 92% for a film 655 nm thick. Substrate temperature, fluorine flow rate are main parameters affecting sheet resistance and transmittance of the resulting films. Oxygen flow rate also influences the film quality in some extent.

Citation Download Citation

Honglei Ma, Deheng Zhang, Youpeng Chen, Shuying Li, Jin Ma, and Fujian Zong "Large-scale flourine-doped textured transparent conducting SnO2 films deposited by APCVD", Proc. SPIE 2897, Electro-Optic and Second Harmonic Generation Materials, Devices, and Applications, (3 October 1996); https://doi.org/10.1117/12.252947

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