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13 May 1997 Influence of substrate cleaning on LIDT of 355 nm HR coatings
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Abstract
An advanced high-purity reactive e-beam evaporation process was used to deposit Al2O3/SiO2 HR coatings for 355 nm high-power laser applications. Both 1:1 and R:1, 6 ns pulse width, laser-induced damage threshold (LIDT) tests for normal and non-normal incident design were performed to study the influence of quartz substrate cleaning. Damage test results indicate very high LIDT values on clean substrates. Some tested points have R:1 LIDT above 20 J/cm2. Post-cleaning of coated substrates degrades LIDT.
© (1997) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Jean DiJon, Pierre Garrec, Norbert Kaiser, and Uwe B. Schallenberg "Influence of substrate cleaning on LIDT of 355 nm HR coatings", Proc. SPIE 2966, Laser-Induced Damage in Optical Materials: 1996, (13 May 1997); https://doi.org/10.1117/12.274290
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