Influence of substrate cleaning on LIDT of 355 nm HR coatings

Jean DiJon; Pierre Garrec; Norbert Kaiser; Uwe B. Schallenberg

doi:10.1117/12.274290

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13 May 1997 Influence of substrate cleaning on LIDT of 355 nm HR coatings

Jean DiJon, Pierre Garrec, Norbert Kaiser, Uwe B. Schallenberg

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Proceedings Volume 2966, Laser-Induced Damage in Optical Materials: 1996; (1997) https://doi.org/10.1117/12.274290
Event: Laser-Induced Damage in Optical Materials: 1996, 1996, Boulder, CO, United States

Abstract

An advanced high-purity reactive e-beam evaporation process was used to deposit Al₂O₃/SiO₂ HR coatings for 355 nm high-power laser applications. Both 1:1 and R:1, 6 ns pulse width, laser-induced damage threshold (LIDT) tests for normal and non-normal incident design were performed to study the influence of quartz substrate cleaning. Damage test results indicate very high LIDT values on clean substrates. Some tested points have R:1 LIDT above 20 J/cm². Post-cleaning of coated substrates degrades LIDT.

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Jean DiJon, Pierre Garrec, Norbert Kaiser, and Uwe B. Schallenberg "Influence of substrate cleaning on LIDT of 355 nm HR coatings", Proc. SPIE 2966, Laser-Induced Damage in Optical Materials: 1996, (13 May 1997); https://doi.org/10.1117/12.274290

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