Paper
13 May 1997 Ultrafast laser-induced microexplosions in transparent materials
Eli N. Glezer, Li Huang, Richard J. Finlay, Tsing-Hua Her, John Paul Callan, Christopher B. Schaffer, Eric Mazur
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Abstract
Submicron-diameter structures can be produced inside many transparent materials by tightly focused 100-fs laser pulses. The ultrafast energy deposition creates very high temperature and pressure inside the region, initiating a 'microexplosion'. Material is ejected from the center and forced into the surrounding volume, forming a void surrounded by densified material. Scanning electron microscopy and atomic force microscopy show structural changes confined to an area 200 nm in diameter.
© (1997) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Eli N. Glezer, Li Huang, Richard J. Finlay, Tsing-Hua Her, John Paul Callan, Christopher B. Schaffer, and Eric Mazur "Ultrafast laser-induced microexplosions in transparent materials", Proc. SPIE 2966, Laser-Induced Damage in Optical Materials: 1996, (13 May 1997); https://doi.org/10.1117/12.274281
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Cited by 5 scholarly publications.
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KEYWORDS
Silica

Ultrafast phenomena

Absorption

Scanning electron microscopy

Atomic force microscopy

Electrons

Objectives

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