Impact of phase mask technique in guided-wave device production

Salim K. Juma; Peter Kung; Chad Clark

doi:10.1117/12.264158

23 January 1997 Impact of phase mask technique in guided-wave device production

Salim K. Juma, Peter Kung, Chad Clark

Proceedings Volume 2997, Integrated Optics Devices: Potential for Commercialization; (1997) https://doi.org/10.1117/12.264158
Event: Photonics West '97, 1997, San Jose, CA, United States

Abstract

The advent of phase mask technique has made it possible to fabricate Bragg gratings to tight tolerances in a repeatable, reliable and cost effective manner. These gratings are in turn making it possible to manufacture a wide variety of high performance guided wave devices for lightwave communication and sensor applications. This paper will review the phase mask fabrication technology and the commercially available products. the paper will then discuss a few successful applications of grating based devices currently entering the market, in particular, wavelength demultiplexing devices, gain flattening filters for EDFA and dispersion compensators, all of which are critical elements in high data rate lightwave systems.

Citation Download Citation

Salim K. Juma, Peter Kung, and Chad Clark "Impact of phase mask technique in guided-wave device production", Proc. SPIE 2997, Integrated Optics Devices: Potential for Commercialization, (23 January 1997); https://doi.org/10.1117/12.264158

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