Recent development on silica waveguide technology for integrated optics

Soichi Kobayashi

doi:10.1117/12.264156

23 January 1997 Recent development on silica waveguide technology for integrated optics

Soichi Kobayashi

Proceedings Volume 2997, Integrated Optics Devices: Potential for Commercialization; (1997) https://doi.org/10.1117/12.264156
Event: Photonics West '97, 1997, San Jose, CA, United States

Abstract

Silica waveguide technologies have been developed based on a combination of the flame hydrolysis deposition and reactive ion etching, which have the advantage of structure controllability and reproducibility of integrated circuits. The bonding technology using UV adhesive and the mold packaging technology have been developed. Silica waveguide integrated devices such as 1 by N, 2 by N and N by N, polarization maintaining splitters, wavelength division multi/demultiplexers, frequency division multi/demultiplexers, dense WDMs, and optical switching devices can be commercially produced with these technologies.

Citation Download Citation

Soichi Kobayashi "Recent development on silica waveguide technology for integrated optics", Proc. SPIE 2997, Integrated Optics Devices: Potential for Commercialization, (23 January 1997); https://doi.org/10.1117/12.264156

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