E-beam lithography: an efficient tool for the fabrication of diffractive and micro-optical elements

Ernst-Bernhard Kley; Bernd Schnabel; Uwe D. Zeitner

doi:10.1117/12.271417

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11 April 1997 E-beam lithography: an efficient tool for the fabrication of diffractive and micro-optical elements

Ernst-Bernhard Kley, Bernd Schnabel, Uwe D. Zeitner

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Proceedings Volume 3008, Miniaturized Systems with Micro-Optics and Micromechanics II; (1997) https://doi.org/10.1117/12.271417
Event: Photonics West '97, 1997, San Jose, CA, United States

Abstract

The fabrication of surface profiles for microoptical and micromechanical devices becomes more and more important. Especially the high accuracy necessary for the realization of the functional components benefits from the use of e-beam lithography, either for the fabrication of tools for optical lithography and replication techniques or for the direct writing of the pattern. After a classification of the pattern and an introduction into the processes for the realization of surface structures we show examples for the basic structure classes as well as for the integration of several properties within one profile resulting in elements with higher complexity.

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Ernst-Bernhard Kley, Bernd Schnabel, and Uwe D. Zeitner "E-beam lithography: an efficient tool for the fabrication of diffractive and micro-optical elements", Proc. SPIE 3008, Miniaturized Systems with Micro-Optics and Micromechanics II, (11 April 1997); https://doi.org/10.1117/12.271417

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