Bleaching-induced changes in the dispersion curves of DNQ photoresists

Clifford L. Henderson; C. Grant Willson; Ralph R. Dammel; Ron A. Synowicki

doi:10.1117/12.275861

7 July 1997 Bleaching-induced changes in the dispersion curves of DNQ photoresists

Clifford L. Henderson, C. Grant Willson, Ralph R. Dammel, Ron A. Synowicki

Proceedings Volume 3049, Advances in Resist Technology and Processing XIV; (1997) https://doi.org/10.1117/12.275861
Event: Microlithography '97, 1997, Santa Clara, CA, United States

Abstract

Three sets of data are required to model a non-chemically amplified photoresist: the exposure or ABC (Dill) parameters, the development parameters, and the refractive index. The refractive index of photoresists has often been considered constant in simulations and other work. However, the refractive index can change as the chemical composition of the photoresist is modified during the exposure reaction. This work presents a study of the refractive index as a function of exposure for a series of commercial, nonchemically amplified DNQ/novolak photoresists using spectroscopic ellipsometry. It was found that the real part of the refractive index for a photoresist changes by as much as 5% at the wavelength of exposure, in part due to the resist bleaching which removes the anomalous dispersion contributions to the refractive index. A discussion of the impact of such refractive index changes on Dill parameter extraction and the simulation of standing wave patterns are presented.

Citation Download Citation

Clifford L. Henderson, C. Grant Willson, Ralph R. Dammel, and Ron A. Synowicki "Bleaching-induced changes in the dispersion curves of DNQ photoresists", Proc. SPIE 3049, Advances in Resist Technology and Processing XIV, (7 July 1997); https://doi.org/10.1117/12.275861

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