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7 July 1997 Novel polymeric dyes for bottom antireflective coatings
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In lithographic processing, implementation of a bottom antireflective coating can reduce or eliminate reflective notching and swing effects, thereby improving linewidth (CD) control. We have recently synthesized a series of novel polymeric dyes and evaluated them as bottom antireflective coatings for i-line lithographic applications. This work has led to the development of the BARLiTM II commercial bottom coat material. The BARLiTM II films show high absorbance at 365 nm and excellent coating uniformity. They are tailor- made to yield the optimum values for refractive indices (n and k) for i-line which ensures minimum reflectivity and maximum swing reduction for photoresist layers. BARLiTM II materials are formulated in photoresist compatible solvents to simplify the EBR process and to be environmentally and user friendly. Data presented in this paper also include BARLiTM II thermal stability, resist intermixing test, etch selectivity, swing reduction, lithographic performance, and step coverage profiles.
© (1997) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Shuji Ding, Ping-Hung Lu, Ralph R. Dammel, Jianhui Shan, Salem Mehtsun, T. T. Hannigan, D. E. Eberly, Dinesh N. Khanna, and Hatsuyuki Tanaka "Novel polymeric dyes for bottom antireflective coatings", Proc. SPIE 3049, Advances in Resist Technology and Processing XIV, (7 July 1997);


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