Overview of photoacid generator design for acetal resist systems

Francis M. Houlihan; Omkaram Nalamasu; Elsa Reichmanis; Allen G. Timko; Ulrike Varlemann; Thomas I. Wallow; N. R. Bantu; John J. Biafore; Thomas R. Sarubbi; Pasquale A. Falcigno; H. J. Kirner; Norbert Muenzel; Klaus Petschel; Hans-Thomas Schacht; Reinhard Schulz

doi:10.1117/12.275848

7 July 1997 Overview of photoacid generator design for acetal resist systems

Francis M. Houlihan, Omkaram Nalamasu, Elsa Reichmanis, Allen G. Timko, Ulrike Varlemann, Thomas I. Wallow, N. R. Bantu, John J. Biafore, Thomas R. Sarubbi, Pasquale A. Falcigno, H. J. Kirner, Norbert Muenzel, Klaus Petschel, Hans-Thomas Schacht, Reinhard Schulz

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Proceedings Volume 3049, Advances in Resist Technology and Processing XIV; (1997) https://doi.org/10.1117/12.275848
Event: Microlithography '97, 1997, Santa Clara, CA, United States

Abstract

An overview is given of how the design of photoacid generators (PAGs) is critical to tuning both the lithographic and thermal properties of chemically amplified resist systems. The importance of PAG chemistry is illustrated with an ARCH resist system that contains acetal protecting groups removable with low activation energies. We detail the effect of PAG on the resist's resolution, depth of focus and thermal decomposition temperature.

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Francis M. Houlihan, Omkaram Nalamasu, Elsa Reichmanis, Allen G. Timko, Ulrike Varlemann, Thomas I. Wallow, N. R. Bantu, John J. Biafore, Thomas R. Sarubbi, Pasquale A. Falcigno, H. J. Kirner, Norbert Muenzel, Klaus Petschel, Hans-Thomas Schacht, and Reinhard Schulz "Overview of photoacid generator design for acetal resist systems", Proc. SPIE 3049, Advances in Resist Technology and Processing XIV, (7 July 1997); https://doi.org/10.1117/12.275848

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