Photoresist materials: a historical perspective

C. Grant Willson; Ralph R. Dammel; Arnost Reiser

doi:10.1117/12.275826

7 July 1997 Photoresist materials: a historical perspective

C. Grant Willson, Ralph R. Dammel, Arnost Reiser

Proceedings Volume 3049, Advances in Resist Technology and Processing XIV; (1997) https://doi.org/10.1117/12.275826
Event: Microlithography '97, 1997, Santa Clara, CA, United States

Abstract

This paper provides a short history of the development of resist materials. We trace the development of resists from the very beginnings of photography in the early 1800s to today's efforts to develop 193 nm resist materials.

Citation Download Citation

C. Grant Willson, Ralph R. Dammel, and Arnost Reiser "Photoresist materials: a historical perspective", Proc. SPIE 3049, Advances in Resist Technology and Processing XIV, (7 July 1997); https://doi.org/10.1117/12.275826

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